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  • 1.
    Ali, Sharafat
    et al.
    Linnaeus University, Faculty of Technology, Department of Built Environment and Energy Technology. Corning Inc, USA.
    Paul, Biplab
    Linköping University.
    Magnusson, Roger
    Linköping University.
    Broitman, Esteban
    Linköping University.
    Jonson, Bo
    Linnaeus University, Faculty of Technology, Department of Built Environment and Energy Technology.
    Eklund, Per
    Linköping University.
    Birch, Jens
    Linköping University.
    Synthesis and characterization of the mechanical and optical properties of Ca-Si-O-N thin films deposited by RF magnetron sputtering2017In: Surface & Coatings Technology, ISSN 0257-8972, E-ISSN 1879-3347, Vol. 315, p. 88-94Article in journal (Refereed)
    Abstract [en]

    Ca-Si-O-N thin films were deposited on commercial soda-lime silicate float glass, silica wafers and sapphire substrates by RF magnetron co-sputtering from Ca and Si targets in an Ar/N-2/O-2 gas mixture. Chemical composition, surface morphology, hardness, reduced elastic modulus and optical properties of the films were investigated using X-ray photoelectron spectroscopy, scanning electron microscopy, nanoindentation, and spectroscopic ellipsometry. It was found that the composition of the films can be controlled by the Ca target power, predominantly, and by the reactive gas flow. Thin films in the Ca-Si-O-N system are composed of N and Ca contents up to 31 eq. % and 60 eq. %, respectively. The films thickness ranges from 600 to 3000 nm and increases with increasing Ca target power. The films surface roughness varied between 2 and 12 nm, and approximately decreases with increasing power of Ca target. The hardness (4-12 GPa) and reduced elastic modulus (65-145 GPa) of the films increase and decrease with the N and Ca contents respectively. The refractive index (1.56-1.82) is primarily dictated by the N content. The properties are compared with findings for bulk glasses in the Ca-Si-(Al)-O-N systems, and it is concluded that Ca-Si-O-N thin films have higher values of hardness, elastic modulus and refractive index than bulk glasses of similar composition. (C) 2017 Elsevier B.V. All rights reserved.

  • 2.
    Ali, Sharafat
    et al.
    Linnaeus University, Faculty of Technology, Department of Built Environment and Energy Technology.
    Paul, Biplab
    Linköping University, Sweden.
    Magnusson, Roger
    Linköping University, Sweden.
    Erik, Ekström
    Linköping University, Sweden.
    Pallier, Camille
    Linköping University, Sweden.
    Jonson, Bo
    Linnaeus University, Faculty of Technology, Department of Built Environment and Energy Technology.
    Eklund, Per
    Linköping University, Sweden.
    Birch, Jens
    Linköping University, Sweden.
    Optical and mechanical properties of amorphous Mg-Si-O-N thin films deposited by reactive magnetron sputtering2019In: Surface & Coatings Technology, ISSN 0257-8972, E-ISSN 1879-3347, Vol. 372, no 25, p. 9-15Article in journal (Refereed)
    Abstract [en]

    In this work, amorphous thin films in Mg-Si-O-N system typically containing >15 at.% Mg and 35 at.% N were prepared in order to investigate especially the dependence of optical and mechanical properties on Mg composition. Reactive RF magnetron co-sputtering from magnesium and silicon targets were used for the deposition of Mg-Si-O-N thin films. Films were deposited on float glass, silica wafers and sapphire substrates in an Ar, N2 and O2 gas mixture. X-ray photoelectron spectroscopy, atomic force microscopy, scanning electron microscopy, spectroscopic ellipsometry, and nanoindentation were employed to characterize the composition, surface morphology, and properties of the films. The films consist of N and Mg contents up to 40 at.% and 28 at.%, respectively and have good adhesion to substrates and are chemically inert. The thickness and roughness of the films increased with increasing content of Mg. Both hardness (16–21 GPa) and reduced elastic modulus (120–176 GPa) are strongly correlated with the amount of Mg content. The refractive index up to 2.01 and extinction coefficient up to 0.18 were found to increase with Mg content. The optical band gap (3.1–4.3) decreases with increasing the Mg content. Thin film deposited at substrate temperature of 100 °C shows a lower value of hardness (10 GPa), refractive index (1.75), and higher values of reduced elastic modulus (124 GPa) as compared to the thin film deposited at 310 °C and 510 °C respectively, under identical synthesis parameters.

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