There is an increasing demand for glass materials with better mechanical and optical properties for display and electronic applications. This paper describes the deposition of novel thin films of Mg-Si-O-N onto float glass substrates. Amorphous thin films in the Mg-Si-O-N system with high nitrogen and magnesium contents were deposited by reactive RF magnetron co-sputtering from Mg and Si targets in Ar/N2/O2 gas mixtures. The thin films studied span an unprecedented range of compositions up to 45 at% Mg and 80 at% N out of cations and anions respectively. Thin films in the Mg-Si-O-N system were found to be homogeneous and transparent in the visible region. Mechanical properties like hardness (H) and reduced elastic modulus (Er) show high values, up to 21 GPa and 166 GPa respectively. The refractive index (1.87-2.00) increases with increasing magnesium and nitrogen contents.